Thermal stability of copper nitride thin films: The role of nitrogen migration
نویسندگان
چکیده
R. Gonzalez-Arrabal, N. Gordillo, M. S. Martin-Gonzalez, R. Ruiz-Bustos, and F. Agulló-López Instituto de Fusión Nuclear, ETSI de Industriales, Universidad Politécnica de Madrid, E-28006 Madrid, Spain Instituto de Microelectrónica de Madrid, C/Isaac Newton, 8 Tres Cantos, E-28760 Madrid, Spain Parque Científico de Madrid, Campus de Cantoblanco, E-28049 Madrid, Spain Centro de Microanálisis de Materiales, Universidad Autónoma de Madrid, E-28049 Madrid, Spain Instituto de Energías Renovables, Parque Científico y Tecnológico de Albacete, Paseo de la Investigación 1, E-02006 Albacete, Spain Departamento de Física de Materiales, Universidad Autónoma de Madrid, E-28049 Madrid, Spain
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